Annual Member
| Author | Haydary, Juma, author |
|---|---|
| Title | Chemical process design and simulation : Aspen Plus and Aspen Hysys applications / Juma Haydary |
| Imprint | New York : American Institute of Chemical Engineers / John Wiley & Sons, 2019 |
| Descript | xliv, 391 pages : illustrations ; 29 cm |
| LOCATION | CALL# | STATUS |
|---|---|---|
| Science Library | TP155.7 C517h 2019 | CHECK SHELVES |
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