This research was studied the effect of composition, thickness and power of Aluminium-Nitride-coated on electrode plates on corrosion-resistance and conductivity. The Aluminium Nitride thin film was deposited on SUS 301 stainless steel plate by a DC magnetron sputtering technique. The Al : N compositions were examined in terms of used N2 partial pressure (0-50%) during the sputtering process. The crystal structure of AlN thin film was determined by X-Ray Diffraction (XRD) technique. The electrical conductivity was measured and expressed in interfacial contact resistance. The corrosion rate was determined in 0.1 M sulfuric acid by electrochemical method. The results were showed that, AlN thin film in form of Wurtzite (hexagonal) could be prepared by DC magnetron sputtering technique. The optimum content of N2 partial pressure was approximately 5% for both interfacial contact resistance and corrosion rate because of its relatively low. The thickness had also effected on interfacial contract resistance and corrosion rate. The optimum film thickness of 18 µm with interfacial contact resistance at 200 lbf.in of moment torque was 5.8 mΩ.cm2 and corrosion rate was 8.2 µA/cm2. The optimum power of 200 watts with 10 µm thickness had interfacial contact resistance and corrosion rate 3 mΩ.cm2 and 12.9 µA/cm2, respectively.
