SiGe and Si strained-layer epitaxy for silicon heterostructure devices [electronic resource] / edited by John D. Cressler

Title	SiGe and Si strained-layer epitaxy for silicon heterostructure devices [electronic resource] / edited by John D. Cressler
Imprint	Boca Raton : CRC Press/Taylor & Francis, c2008
Connect to	http://marc.crcnetbase.com/isbn/9781420066869
Descript	264 p. : ill

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