Plasma etching : fundamentals and applications / M. Sugawara ; with contributions from barry L. Stonsfield ... [etal.]
Imprint
Oxford ; New York : Oxford University Press, 1998
Descript
viii, 347 p. : ill. ; 24 cm
CONTENT
RF discharges -- Physical basis of the plasma etching process -- Plasma particles and potentials -- Technology of reactive ion etching -- Magnetic field coupled etching -- ECR plasma etching -- Future prospects of plasma etching