| Author | Sugawara, M. (Minoru) |
|---|---|
| Title | Plasma etching : fundamentals and applications / M. Sugawara ; with contributions from barry L. Stonsfield ... [etal.] |
| Imprint | Oxford ; New York : Oxford University Press, 1998 |
| Descript | viii, 347 p. : ill. ; 24 cm |
RF discharges -- Physical basis of the plasma etching process -- Plasma particles and potentials -- Technology of reactive ion etching -- Magnetic field coupled etching -- ECR plasma etching -- Future prospects of plasma etching
| LOCATION | CALL# | STATUS |
|---|---|---|
| Science Library | TK7871.85 P715s 1998 | CHECK SHELVES |
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