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AuthorSugawara, M. (Minoru)
TitlePlasma etching : fundamentals and applications / M. Sugawara ; with contributions from barry L. Stonsfield ... [etal.]
Imprint Oxford ; New York : Oxford University Press, 1998
Descript viii, 347 p. : ill. ; 24 cm


RF discharges -- Physical basis of the plasma etching process -- Plasma particles and potentials -- Technology of reactive ion etching -- Magnetic field coupled etching -- ECR plasma etching -- Future prospects of plasma etching

Semiconductors -- Etching Plasma etching

Science LibraryTK7871.85 P715s 1998CHECK SHELVES

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