AuthorSugawara, M. (Minoru)
TitlePlasma etching : fundamentals and applications / M. Sugawara ; with contributions from barry L. Stonsfield ... [etal.]
Imprint Oxford ; New York : Oxford University Press, 1998
Descript viii, 347 p. : ill. ; 24 cm

CONTENT

RF discharges -- Physical basis of the plasma etching process -- Plasma particles and potentials -- Technology of reactive ion etching -- Magnetic field coupled etching -- ECR plasma etching -- Future prospects of plasma etching


SUBJECT

  1. Semiconductors -- Etching
  2. Plasma etching

LOCATIONCALL#STATUS
Science LibraryTK7871.85 P715s 1998 CHECK SHELVES