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AuthorKleijn, Chris R. author
TitleModeling of Chemical Vapor Deposition of Tungsten Films [electronic resource] / by Chris R. Kleijn, Christoph Werner
ImprintBasel : Birkhรคuser Basel : Imprint: Birkhรคuser, 1993
Connect tohttp://dx.doi.org/10.1007/978-3-0348-7741-1
Descript 139 p. online resource

SUMMARY

Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were perยญ formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects


CONTENT

Principal Symbols -- 1 Introduction -- 2 Mathematical models for chemical vapor deposition -- 3 Thermal modeling -- 4 Blanket tungsten deposition -- 5 Selective tungsten deposition -- 6 Conclusions


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